A highly technical paper that reviews literature on the operating procedure and magnetic properties of electrochemical deposited Co-based magnetic films.
2,057 words (approx. 8.2 pages), 13 sources, 2001, $ 64.95
Abstract This report reviews literature on the operating procedure and magnetic properties of electrochemical deposited Co-based magnetic films. The significance and limitations of electrochemical deposit Co-based magnetic films are analyzed.
From the Paper " Hard magnetic materials have been a focus of interest in electrical engineering for years because of their applications as media in recording and potential applications in fabricating magnetic MEMS devices due to the strong magnetic field produced by them in absence of applying magnetic field1.2. Besides the hard ferrites and Nd2Fe14 B1, Cobalt or Cobalt-RE based magnets are mostly used hard magnetic materials because of their good magnetic properties as well as their excellent mechanical properties1. Generally speaking, Cobalt based hard magnetic materials are fabricated by PVD methods such as RF sputtering or evaporation. However, it is likely to be time and money consuming to apply these procedures, especially for a relatively thick film, say, 20mm or more, is needed. Furthermore, the fabrication of the film-type magnets on silicon wafers with CMOS integrated circuits has been considered as one of the most extremely difficult tasks due to the fabrication processing incompatibility between them."
Abstract This report reviews literature on magnetic properties of electroplated Co-based magnetic films. The significance and limitations of electroplating Co-based magnetic films are analyzed. Complete with diagrams and charts.
From the Paper "Hard magnetic materials (permanent magnets) are suitable for use as media in recording and to fabricate magnetic MEMS devices because they can produce strong fields without having to apply a current to a coil; hence, they attracted more attentions in the electrical engineering recently [1-2]. Besides the hard ferrites and Nd2Fe14 B1, Cobalt or Cobalt-RE based magnets are mostly used hard magnetic materials. [1] Because of their good magnetic properties as well as their excellent mechanical properties. General speaking, Cobalt based hard magnetic materials can be fabricate by CVD or PVD such as RF sputtering, which will take pretty long time and cost much if one want to make relatively thick film that is around 20 mm or even thicker. Also, the fabrication of the film-type magnets on silicon wafers with CMOS integrated circuits has been considered as one of the most extremely difficult tasks due to the fabrication processing incompatibility between them [3]."
