Cobalt-based Hard Magnetic Films

Paper Summary:

This report reviews literature on the operating procedure and magnetic properties of electrochemical deposited Co-based magnetic films. The significance and limitations of electrochemical deposit Co-based magnetic films are analyzed.

From the Paper:

" Hard magnetic materials have been a focus of interest in electrical engineering for years because of their applications as media in recording and potential applications in fabricating magnetic MEMS devices due to the strong magnetic field produced by them in absence of applying magnetic field1.2. Besides the hard ferrites and Nd2Fe14 B1, Cobalt or Cobalt-RE based magnets are mostly used hard magnetic materials because of their good magnetic properties as well as their excellent mechanical properties1. Generally speaking, Cobalt based hard magnetic materials are fabricated by PVD methods such as RF sputtering or evaporation. However, it is likely to be time and money consuming to apply these procedures, especially for a relatively thick film, say, 20mm or more, is needed. Furthermore, the fabrication of the film-type magnets on silicon wafers with CMOS integrated circuits has been considered as one of the most extremely difficult tasks due to the fabrication processing incompatibility between them."

More papers on Cobalt-based Hard Magnetic Films:

• Essay # 2957 : "Electroplated Cobalt-Based Films"
• Descriptive Essay # 91396 : "Magnetic Hard Disk Drive"
• Essay # 63584 : "The Films of Phil Karlson"

APA Citation:

MLA Citation: